Science

Advanced thin film x-ray diffraction techniques

Date: 

Thursday, 12 September, 2019 -
10:00 to 15:00

Where: 

UNSW Chemical Sciences Building, Mezzanine Level, Room M10

Hosts: 

School of Materials Science and Engineering

This course covers the basics of x-ray diffraction (XRD) for thin films. Standard measurements such as coupled scans, rocking curves, and x-ray reflectometry are discussed. The second part of the course will introduce more advanced concepts: pole figures, and reciprocal space mapping.

After this course, students will be able to determine phase purity and lattice parameters of a thin film, evaluate crystalline quality, determine the texturing and/or epitaxial relationship of an epitaxial thin film, and identify film/substrate heterostructures from a set of data.

 

Biography: 

Dr. Daniel Sando received his PhD in Physics from Queensland University of Technology in 2010. He held postdoctoral positions in Unité Mixte de Physique CNRS/Thales in France (2010-2013) and Seoul National University, South Korea (2014-2015), before joining UNSW Sydney (School of Materials Science and Engineering) as a research fellow in 2015. From 2019 he is a research fellow at the Mark Wainwright Analytical Centre (UNSW Sydney).

His research focuses on the study of complex oxide thin films, notably ferroelectrics, multiferroics, and topological oxides. He is an expert on the techniques of pulsed laser deposition, scanning probe microscopy, x-ray diffraction, and optical characterisation methods.